R. Windholz et Pa. Molian, NANOSECOND PULSED EXCIMER-LASER MACHINING OF CHEMICALLY VAPOR-DEPOSITED DIAMOND AND GRAPHITE - PART II - ANALYSIS AND MODELING, Journal of Materials Science, 33(2), 1998, pp. 523-528
Analysis of the experimental data presented in Part I of this paper an
d those available in the literature revealed that the mechanism of mat
erial removal in laser machining of chemically vapour-deposited diamon
d is a two-step process: diamond transforms to graphite, and subsequen
tly graphite sublimates. The energy fluence required for the formation
of graphite is much lower than its removal by sublimation, and both a
re sensitive to the wavelength of the laser beam, the impurities prese
nt in the film and the environment during machining. When a 248 nm exc
imer laser beam interacts with diamond, there is an energy loss of 20%
by reflection and 10% by transmission. The remaining 70% energy is us
ed for heating the diamond, converting diamond to graphite, and sublim
ating graphite. Graphite is removed mostly by physical ablation and to
some extent by chemical oxidation with the ambient. A theoretical cal
culation based on bond strength estimates that the threshold energy fl
uence for the ablation of diamond is 0.37 Jcm(-2). The experimental en
ergy fluence was 0.8 Jcm(-2). Experimental results on the material rem
oval rates as a function of energy fluence closely follow the Beer-Lam
bert equation, suggesting that physical ablation is the determining me
chanism. Temperature calculations showed that both diamond and graphit
e tend to oxidize in a single laser pulse that contributes to the mate
rial removal.