INFLUENCE OF THERMAL BARRIERS ON HEAT-FLOW IN HIGH-QUALITY CHEMICAL-VAPOR-DEPOSITED DIAMOND

Citation
J. Hartmann et al., INFLUENCE OF THERMAL BARRIERS ON HEAT-FLOW IN HIGH-QUALITY CHEMICAL-VAPOR-DEPOSITED DIAMOND, Physical review letters, 80(1), 1998, pp. 117-120
Citations number
14
Categorie Soggetti
Physics
Journal title
ISSN journal
00319007
Volume
80
Issue
1
Year of publication
1998
Pages
117 - 120
Database
ISI
SICI code
0031-9007(1998)80:1<117:IOTBOH>2.0.ZU;2-Y
Abstract
Thermal barriers in high quality chemical vapor deposited (CVD) diamon d were investigated by photothermal microscopy. High resolution measur ements confirm that the in-plane heat transport is strongly limited by the presence of thermal barriers. Thermal resistances in the range of 10(-9) to 10(-8) m(2)K/W located at grain boundaries are extracted fr om photothermal line scans. Recently published data on macroscopic one -dimensional thermal transport in CVD diamond are well explained by th e microscopic measurements in connection with a simple one-dimensional heat flow model.