A NEW CALIX[4] ARENE-BASED BARIUM PRECURSOR FOR BAO-TIO2 THIN-FILM DEPOSITION

Citation
V. Burtman et al., A NEW CALIX[4] ARENE-BASED BARIUM PRECURSOR FOR BAO-TIO2 THIN-FILM DEPOSITION, Chemistry of materials, 9(12), 1997, pp. 3101-3106
Citations number
53
Journal title
ISSN journal
08974756
Volume
9
Issue
12
Year of publication
1997
Pages
3101 - 3106
Database
ISI
SICI code
0897-4756(1997)9:12<3101:ANCABP>2.0.ZU;2-S
Abstract
In the present work we describe the design, syntheses, and use of a ne w barium metalloorganic precursor for barium titanate thin film deposi tion. Barium-containing thin films deposited by different deposition m ethods are widely used for various applications in optics and electron ics. An important goal for applications is concerned with the producti on of stable, fluorine free barium-metalloorganic precursor materials, to obtain better performance photonic devices. We describe an alterna tive barium-metalloorganic precursor based on a calixarene ligand, its application to dip coating and thin film growth of the BaO-TiO2 famil y of compounds, and studies of these films by second harmonic generati on. The BaTiO3 films showed promising nonlinear optical response for g uided wave-applications.