ESTIMATION OF FRONT VELOCITY IN ELECTRODEPOSITION ONTO HIGHLY RESISTIVE SUBSTRATES

The primary current distribution for electrodeposition onto a surface composed of a perfectly conducting section and. a highly resistive sec tion is examined, both by direct numerical calculation and by singular -perturbation analysis. Results of the study show how the current dens ity and the region over which electrodeposition reactions are apprecia ble scale with the conductivity and thickness of the resistive section of the electrode. The perturbation analysis leads to an approximate e xpression (Eq. 34 in text) for the front velocity of a growing metalli c film, a result which is of practical interest for design estimates o f the speed of coverage in metallization processes on resistive substr ates.