A measurement of the electrical parameters degradation of Si photodiod
es irradiated by laser visible light has been performed. The laser is
a Q-switched Nd:YAG, frequency doubled, operated in single pulse mode
of 4 ns duration. The applied fluence levels range up to 90 J/cm(2). T
wo kinds of irradiation process were applied: either a part of the det
ector active area was irradiated in single pulse mode, or a scanning o
f the whole detector active area was performed with successive identic
al pulses. It has been shown that the fluence necessary to induce sign
ificant changes (local decrease of 35%) in responsivity is several tim
es the surface melting threshold fluence (0.5 J/cm(2)). Conversely, th
e dark current is the most sensitive parameter, increasing by about fo
ur times for high irradiation. The in-depth dopant distribution is alt
ered by high fluence irradiation in a way that cannot be explained by
simple thermal modelling. (C) 1997 Published by Elsevier Science Ltd.