SPECTROSCOPIC STUDIES OF HEAVILY CARBON-DOPED GAAS GROWN BY METAL-ORGANIC CHEMICAL-VAPOR EPITAXY

Citation
Hz. Wu et al., SPECTROSCOPIC STUDIES OF HEAVILY CARBON-DOPED GAAS GROWN BY METAL-ORGANIC CHEMICAL-VAPOR EPITAXY, Applied spectroscopy, 51(12), 1997, pp. 1849-1853
Citations number
21
Journal title
ISSN journal
00037028
Volume
51
Issue
12
Year of publication
1997
Pages
1849 - 1853
Database
ISI
SICI code
0003-7028(1997)51:12<1849:SSOHCG>2.0.ZU;2-T
Abstract
Spectroscopic studies of the minority electron lifetimes and photolumi nescence efficiencies of heavily carbon-doped GaAs are reported. The G aAs layers were grown by metal organic chemical vapor epitaxy (MOVPE) at 650 degrees C with carbon tetrabromide used as a dopant source, Com bined minority electron lifetime and internal quantum efficiency measu rements allowed us to determine the radiative decay times in heavily c arbon-doped GaAs to be longer than that we would expect if a value for the radiative recombination constant of B = 2.0 X 10(-10) cm(3) s(-1) were used. Taking into account the effects of hole-hole and hole-ioni zed impurity scattering, we show that B decreases as hole density incr eases in heavily carbon-doped GaAs. With the use of the revised values for B, the calculated radiative decay times were compatible with our measurements.