FORMATION AND DISSOLUTION BEHAVIOR OF NIOBIUM OXIDE IN PHOSPHORIC-ACID SOLUTIONS

Authors
Citation
Ga. Elmahdy, FORMATION AND DISSOLUTION BEHAVIOR OF NIOBIUM OXIDE IN PHOSPHORIC-ACID SOLUTIONS, Thin solid films, 307(1-2), 1997, pp. 141-147
Citations number
47
Journal title
ISSN journal
00406090
Volume
307
Issue
1-2
Year of publication
1997
Pages
141 - 147
Database
ISI
SICI code
0040-6090(1997)307:1-2<141:FADBON>2.0.ZU;2-8
Abstract
The effect of phosphoric acid concentration and temperature on the for mation and dissolution process of niobium oxide was investigated using capacitance, potential and galvanostatic measurements. The formation rate of the niobium oxide increases with increasing phosphoric acid co ncentration and decreases with increasing temperature. The dissolution rate of the niobium oxide is accelerated by increasing phosphoric aci d concentration and temperature. The activation energy was calculated for both the formation and dissolution process and found to be 8.93 an d 16.65 kJ/mol respectively. The effect of formation voltage on the di ssolution process of niobium oxide was also investigated. The oxide fi lm formed at high-formation voltage has a more defective character tha n that formed at lower voltage. This enhances the dissolution process of the oxide. The effect of current density on the formation rate and the thickness during the oxide film growth was measured. (C) 1997 Else vier Science S.A.