COOPERATIVE EUROPEAN PROGRAMS FOR THE DEVELOPMENT OF SEMICONDUCTOR PATTERNING EQUIPMENT

This paper gives an update on the cooperative programs for semiconduct or equipment development in Europe. The background and founding struct ure of the ESPRIT, and MEDEA programs are explained. Recent projects i n the field of micro lithography equipment such as the step and scan p rograms, the 193 nm technology program ''ELLIPSE and programs to devel op 300 mm wafer equipment are described briefly. In these joint projec ts Semiconductor Manufacturers, Equipment and Material Suppliers and T echnical Institutes are participating. In some cases cooperations with non-European companies have been successfully implemented. This globa l cooperation is expected to increase in view of the increased costs o f technology developments.