ADVANCED THERMAL IMPROVEMENT METHOD FOR CHEMICALLY AMPLIFIED RESISTS

We have developed a new method to achieve both, thermal durability and critical dimension (CD) control using short-duration, deep UV irradia tion for chemically amplified resists at moderate irradiation intensit y and moderate substrate temperature. We obtained thermal durability u p to 140 degrees C and CD control within +/-5% between as-developed re sists and those obtained after baking at 140 degrees C.