X-RAY MICROFABRICATION AT THE CENTER FOR ADVANCED MICROSTRUCTURES ANDDEVICES (CAMD)

Authors
Citation
Ck. Malek et V. Saile, X-RAY MICROFABRICATION AT THE CENTER FOR ADVANCED MICROSTRUCTURES ANDDEVICES (CAMD), JPN J A P 1, 36(12B), 1997, pp. 7732-7735
Citations number
12
Volume
36
Issue
12B
Year of publication
1997
Pages
7732 - 7735
Database
ISI
SICI code
Abstract
The Center for Advanced Microstructures and Devices (CAMD) has establi shed infrastructure and experience for deep X-ray lithography and func tions as a print-shop for high aspect ratio microstructures in the US. A major up-grade of the facility will be completed by the end of 1997 . It includes the installation of a wavelength shifter as a hard X-ray source for ultra-deep X-ray lithography and for cost effective, batch fabrication of high aspect ratio micro-components, This paper describ es the X-ray micromachining facility and programs at CAMD. The scienti fic and engineering activities exemplified by results of current studi es are reported.