The Center for Advanced Microstructures and Devices (CAMD) has establi
shed infrastructure and experience for deep X-ray lithography and func
tions as a print-shop for high aspect ratio microstructures in the US.
A major up-grade of the facility will be completed by the end of 1997
. It includes the installation of a wavelength shifter as a hard X-ray
source for ultra-deep X-ray lithography and for cost effective, batch
fabrication of high aspect ratio micro-components, This paper describ
es the X-ray micromachining facility and programs at CAMD. The scienti
fic and engineering activities exemplified by results of current studi
es are reported.