RESONANCE RAMAN-SCATTERING IN HIGH-QUALITY ZNTE EPILAYERS GROWN BY HOT-WALL EPITAXY

Citation
S. Nam et al., RESONANCE RAMAN-SCATTERING IN HIGH-QUALITY ZNTE EPILAYERS GROWN BY HOT-WALL EPITAXY, Journal of the Korean Physical Society, 32(1), 1998, pp. 82-86
Citations number
15
Categorie Soggetti
Physics
ISSN journal
03744884
Volume
32
Issue
1
Year of publication
1998
Pages
82 - 86
Database
ISI
SICI code
0374-4884(1998)32:1<82:RRIHZE>2.0.ZU;2-I
Abstract
Resonant Raman scattering spectra for high-quality ZnTe epilayers grow n by hot-wall epitaxy have been studied extensively. With a 514.5-nm A r-ion laser as the excitation source, three resonant Raman lines were observed. The temperature characteristics of these three Raman lines w ere related to those of the energy gap of ZnTe. Also, it was confirmed that the strain which remained in the ZnTe/GaAs epilayers was tensile due to the different thermal expansion coefficients.