Sy. Cheng et al., INVESTIGATION OF AN ALINAS GAINAS SUPERLATTICE-EMITTER RESONANT-TUNNELING BIPOLAR-TRANSISTOR (SE-RTBT)/, Superlattices and microstructures, 22(4), 1997, pp. 541-549
A new bipolar transistor with a 20-period i-AlInAs/n(+)-InGaAs superla
ttice, prepared by metal organic chemical vapour deposition, has been
fabricated and demonstrated. This superlattice is used as a confinemen
t barrier for holes and a resonant tunneling (RT) route for electrons.
Due to the RT effect within the 20-period superlattice near emitter-b
ase p-n junction region, the N-shaped negative-differential-resistance
(NDR) phenomena are observed under normal operation. A transistor act
ion with a common-emitter current gain of 13 and a small offset voltag
e (similar to 90 mV) is achieved at room temperature. (C) 1997 Academi
c Press Limited.