INVESTIGATION OF AN ALINAS GAINAS SUPERLATTICE-EMITTER RESONANT-TUNNELING BIPOLAR-TRANSISTOR (SE-RTBT)/

Citation
Sy. Cheng et al., INVESTIGATION OF AN ALINAS GAINAS SUPERLATTICE-EMITTER RESONANT-TUNNELING BIPOLAR-TRANSISTOR (SE-RTBT)/, Superlattices and microstructures, 22(4), 1997, pp. 541-549
Citations number
10
ISSN journal
07496036
Volume
22
Issue
4
Year of publication
1997
Pages
541 - 549
Database
ISI
SICI code
0749-6036(1997)22:4<541:IOAAGS>2.0.ZU;2-W
Abstract
A new bipolar transistor with a 20-period i-AlInAs/n(+)-InGaAs superla ttice, prepared by metal organic chemical vapour deposition, has been fabricated and demonstrated. This superlattice is used as a confinemen t barrier for holes and a resonant tunneling (RT) route for electrons. Due to the RT effect within the 20-period superlattice near emitter-b ase p-n junction region, the N-shaped negative-differential-resistance (NDR) phenomena are observed under normal operation. A transistor act ion with a common-emitter current gain of 13 and a small offset voltag e (similar to 90 mV) is achieved at room temperature. (C) 1997 Academi c Press Limited.