X-RAY PHOTOELECTRON SPECTROSCOPIC STUDY OF THE OXIDE FILM ON AN ALUMINUM-TIN ALLOY IN 3.5-PERCENT SODIUM-CHLORIDE SOLUTION

Authors
VENUGOPAL A VELUCHAMY P SELVAM P MINOURA H RAJA VS
Citation
A. Venugopal et al., X-RAY PHOTOELECTRON SPECTROSCOPIC STUDY OF THE OXIDE FILM ON AN ALUMINUM-TIN ALLOY IN 3.5-PERCENT SODIUM-CHLORIDE SOLUTION, Corrosion, 53(10), 1997, pp. 808-812
Citations number
31
Journal title
Corrosion → ACNP
ISSN journal
00109312
Volume
53
Issue
10
Year of publication
1997
Pages
808 - 812
Database
ISI
SICI code
0010-9312(1997)53:10<808:XPSSOT>2.0.ZU;2-Y
Abstract
Oxide films on Al and an Al-Sn alloy were analyzed by x-ray photoelect ron spectroscopy (XPS) after immersion in 3.5% sodium chloride (NaCl) solution. Results showed Sn exhibited both Sn2+ and Sn4+ oxidation sta tes in the oxide film It was proposed that incorporation of these cati ons in the film would result in generation of more anionic and cationi c vacancies in aluminum oxide (Al2O3), leading to active dissolution o f Al.