Jd. Affinito et al., PML OXIDE/PML BARRIER LAYER PERFORMANCE DIFFERENCES ARISING FROM USE OF UV OR ELECTRON-BEAM POLYMERIZATION OF THE PML LAYERS/, Thin solid films, 308, 1997, pp. 19-25
Polymer/oxide/polymer barrier coatings have been fabricated on 50 mu m
thick and 100 mu m thick polyethylene terephthalate (PET) substrate i
n a roll-to-roll coating process. The oxide layer was either sputtered
or e-beam evaporated Al2O3 and the polymer layers were deposited by t
he polymer multilayer (PML) method [1,2]. The monomer curing method em
ployed to polymerize the PML layers was a parameter affected by varyin
g the cross-linking irradiation between ultraviolet light (UV), electr
on beam irradiation (eb), and UV followed by eb. O-2 and water vapor p
ermeation rates for the three layer structures were up to four orders
of magnitude lower than for the PET substrate alone and up to three or
ders of magnitude lower than for PET with a single oxide layer without
PML layers. Significantly better performance was found for sputtered
Al2O3 when compared with e-beam evaporated Al2O3, With or without the
use of PML layers. Marginally better performance was obtained when PML
layers were UV-cured, as compared with eb curing, with sputtered Al2O
3, while the reverse was true when the Al2O3 was e-beam evaporated. Di
stinct differences in surface topography are observed between UV and e
-beam-cured samples with W-cured samples having significantly smoother
surfaces and as low as 8.5 Angstrom RMS surface roughness. While both
e-beam and UV curing appear to remove all traces of substrate surface
roughness, the e-beam-cured surfaces appear to have a new, smoother,
broader, and longer wavelength, surface roughness relative to the orig
inal substrate. We hypothesize that this new surface topography is due
to electrostatic repulsion of the trapped electrons distorting the li
quid monomer layer before the material is fully solidified. (C) 1997 E
lsevier Science S.A.