FORMATION OF CUBIC BORON-NITRIDE BY THE REACTIVE SPUTTER-DEPOSITION OF BORON

Boron nitride films are synthesized by rf magnetron sputtering baron t argets where the deposition parameters of gas pressure, flow and compo sition are varied along with substrate temperature and applied bias. T he films are analyzed using Anger electron spectroscopy, transmission electron microscopy, nanoindentation, Raman spectroscopy and X-ray abs orption spectroscopy. These techniques provide characterization of fil m composition, crystalline structure, hardness and chemical bending, r espectively. Reactive, rf-sputtering process parameters are establishe d which lead to the growth of crystalline boron nitride (BN) phases. T he deposition of stable and adherent baron nitride coatings consisting of the cubic phase requires 400 degrees C substrate heating and the a pplication of a 300-V negative bias. Published by Elsevier Science S.A .