Amorphous hard carbon films of varying sp(2)/sp(3) fractions were depo
sited on Si using filtered cathodic are deposition with pulsed biasing
. The films were heat treated in air at temperatures up to 550 degrees
C. Raman investigation and nanoindentation were performed to study th
e modification of the films caused by the heat treatment. It was found
that films containing a high sp(3) fraction sustain their hardness fo
r temperatures at least up to 400 degrees C, their structure for tempe
ratures up to 500 degrees C, and show a low rate of material loss duri
ng heat treatment. Films containing a low sp(3) fraction graphitize du
ring heat treatment, show changes in structure and hardness, and have
a high rate of material loss. (C) 1997 Elsevier Science S.A.