GROWTH-CONDITIONS AND PROPERTIES OF TETRAHEDRAL AMORPHOUS-CARBON FILMS

Tetrahedral amorphous carbon (ta-C) films have been prepared by the fi ltered cathodic vacuum are (FCVA) technique. The effect of the deposit ion parameters (such as deposition rate, duct bias and magnetic filter ing field) on the film properties (such as sp(3) fraction, optical ban d gap and stress) were investigated. The film properties were determin ed as a function of the ion energy. A lower deposition rate is found t o be more conducive to the formation of sp(3) bonding which results in a relative increase in the measured film properties. In addition, a h igher optimal energy was also observed. However the change of duct bia s voltage and magnetic filtering field have no effect on the sp(3) bon ding and the position of the optimal energy. (C) 1997 Elsevier Science S.A.