Ai. Danilov et al., THE INFLUENCE OF INTERMEDIATE PARTICLES ON THE NUCLEATION OF COPPER ON POLYCRYSTALLINE PLATINUM, Electrochimica acta, 43(7), 1998, pp. 733-741
The influences of the Cu adatoms and Cu+ ions on the initial stages of
copper electrodeposition on polycrystalline Pt in acidified copper su
lphate solution have been studied by cyclic voltammetry, potentiostati
c current transients, rotating ring-disk electrode (rrde), and in situ
scanning tunnelling microscopy (STM). It has been established that du
ring the long-time polarization of the platinum electrode, at potentia
ls close to the copper equilibrium potential, the concentration of Cu ions in the vicinity of the electrode increases and a Cu microdeposit
if formed. The dissolution of the microdeposit occurs very slowly and
takes several minutes of potential cycling in the range of 0.27-1.25
V. While the microdeposit is present on the platinum, the electrode su
rface is more active with respect to upd and bulk copper deposition. T
he combination of electrochemical and in situ STM results indicates th
at formation of surface alloy occurs during electrodeposition of coppe
r on polycrystalline platinum. (C) 1997 Elsevier Science Ltd.