DOPING OF ALXGA1-XN

Citation
C. Stampfl et Cg. Vandewalle, DOPING OF ALXGA1-XN, Applied physics letters, 72(4), 1998, pp. 459-461
Citations number
23
Categorie Soggetti
Physics, Applied
Journal title
ISSN journal
00036951
Volume
72
Issue
4
Year of publication
1998
Pages
459 - 461
Database
ISI
SICI code
0003-6951(1998)72:4<459:>2.0.ZU;2-8
Abstract
N-type AlxGa1-xN exhibits a dramatic decrease in the free-carrier conc entration for x greater than or equal to 0.40. Based on first-principl es calculations, we propose that two effects are responsible for this behavior: (i) in the case of-doping with oxygen (the most common unint entional donor), a DX transition occurs, which converts the shallow do nor into-a deep level; and (ii) compensation by the cation vacancy (V- Ga or V-Al), a triple acceptor,increases with alloy composition x. For p-type doping, the calculations indicate that the doping efficiency d ecreases due to compensation by the nitrogen vacancy. In addition, an increase in the acceptor ionization energy is found with increasing x.