IMPROVED LOW-FREQUENCY AND MICROWAVE DIELECTRIC RESPONSE IN STRONTIUM-TITANATE THIN-FILMS GROWN BY PULSED-LASER ABLATION

Citation
Mj. Dalberth et al., IMPROVED LOW-FREQUENCY AND MICROWAVE DIELECTRIC RESPONSE IN STRONTIUM-TITANATE THIN-FILMS GROWN BY PULSED-LASER ABLATION, Applied physics letters, 72(4), 1998, pp. 507-509
Citations number
27
Categorie Soggetti
Physics, Applied
Journal title
ISSN journal
00036951
Volume
72
Issue
4
Year of publication
1998
Pages
507 - 509
Database
ISI
SICI code
0003-6951(1998)72:4<507:ILAMDR>2.0.ZU;2-W
Abstract
We have grown epitaxial strontium titanate films on lanthanum aluminat e substrates at a range of oxygen pressures and substrate temperatures . The complex dielectric function was measured as a function of temper ature and electric field bias using a microwave ring resonator and a f lip-chip technique. The films having the highest dielectric constant w ere grown with an oxygen pressure of 600 mTorr and showed large grains in the plane of the film. The small-signal dielectric constant of the se films could be changed by a factor of 4 by applying an electric fie ld. The films with the highest dielectric constant showed increased lo sses, but an improved figure of merit for application to tunable circu its. (C) 1998 American Institute of Physics.