CHARACTERIZATION OF DIRECTLY AND INDIRECTLY OXIDIZED THIN INDIUM FILMS

The structure and morphology of In2O3 films prepared by direct and ind irect oxidation mechanisms are reported. XRD studies of In2O3 films pr epared by annealing of vacuum deposited indium films have shown a < 11 1 > texture while the texture of reactively deposited (directly oxidiz ed) films has been found sensitive to deposition conditions. SEM obser vations show porosity in films obtained by annealing and smooth polycr ystalline nature for reactively deposited films. Electrical and optica l properties of directly oxidized films are found to be superior to th ose of indirectly heated films.