MEASUREMENT OF PHONON-EXCITON DEPHASING RATE IN GAN ON SAPPHIRE BY DEGENERATE 4-WAVE-MIXING

Citation
S. Pau et al., MEASUREMENT OF PHONON-EXCITON DEPHASING RATE IN GAN ON SAPPHIRE BY DEGENERATE 4-WAVE-MIXING, Applied physics letters, 72(5), 1998, pp. 557-559
Citations number
14
Categorie Soggetti
Physics, Applied
Journal title
ISSN journal
00036951
Volume
72
Issue
5
Year of publication
1998
Pages
557 - 559
Database
ISI
SICI code
0003-6951(1998)72:5<557:MOPDRI>2.0.ZU;2-S
Abstract
The density and temperature dependence of the exciton dephasing time o f two hexagonal GaN films on sapphire is measured using degenerate fou r-wave mixing (DFWM). The residual 4 ps dephasing time at low temperat ure and density is caused by exciton-impurity scattering. We present a theory of DFWM for various amount of inhomogeneous broadening. Good a greement of the temperature dependence of the dephasing time is found between theory and experiment. (C) 1998 American Institute of Physics.