Y. Ding et al., FABRICATION BY MAGNETRON SPUTTERING OF AL-CU-FE QUASI-CRYSTALLINE FILMS FOR TRIBOLOGICAL APPLICATIONS, Surface & coatings technology, 96(2-3), 1997, pp. 140-147
Al-Cu-Fe(Al65Cu20Fe15) films were fabricated using an RF triode magnet
ron sputtering technique. The films were characterized by X-ray diffra
ction (XRD), transmission electron microscopy (TEM), selected area ele
ctron diffraction (SAED) and energy dispersive spectroscopy (EDS) tech
niques. The as-sputtered Al-Cu-Fe films had an amorphous structure. Th
e Al-Cu-Fe film annealed at 750 degrees C for 2 h had an icosahedral q
uasicrystalline structure, but annealing at temperatures from 200 degr
ees C to 550 degrees C produced a mixed structure of amorphous and qua
sicrystalline phases. Nanoindentation measurements showed that the har
dness and elastic modulus of the as-sputtered Al-Cu-Fe films (9.44 GPa
and 114.4 GPa, respectively) increased as the amount of the quasicrys
talline phase increased on annealing. The Al-Cu-Fe film annealed at 55
0 degrees C for one hour had a hardness of 13.49 GPa and a Young's mod
ulus of 141.4 GPa. A systematic increase in wear resistance with incre
asing annealing temperature was observed, based on the scratch track w
idth measurements. Both the as-sputtered (amorphous) and annealed (amo
rphous+quasicrystalline) Al-Cu-Fe films friction (0.09-0.11) that were
of the same order as for TiN films produced by reactive ion plating (
RIP). (C) 1997 Elsevier Science S.A.