FABRICATION BY MAGNETRON SPUTTERING OF AL-CU-FE QUASI-CRYSTALLINE FILMS FOR TRIBOLOGICAL APPLICATIONS

Citation
Y. Ding et al., FABRICATION BY MAGNETRON SPUTTERING OF AL-CU-FE QUASI-CRYSTALLINE FILMS FOR TRIBOLOGICAL APPLICATIONS, Surface & coatings technology, 96(2-3), 1997, pp. 140-147
Citations number
32
ISSN journal
02578972
Volume
96
Issue
2-3
Year of publication
1997
Pages
140 - 147
Database
ISI
SICI code
0257-8972(1997)96:2-3<140:FBMSOA>2.0.ZU;2-X
Abstract
Al-Cu-Fe(Al65Cu20Fe15) films were fabricated using an RF triode magnet ron sputtering technique. The films were characterized by X-ray diffra ction (XRD), transmission electron microscopy (TEM), selected area ele ctron diffraction (SAED) and energy dispersive spectroscopy (EDS) tech niques. The as-sputtered Al-Cu-Fe films had an amorphous structure. Th e Al-Cu-Fe film annealed at 750 degrees C for 2 h had an icosahedral q uasicrystalline structure, but annealing at temperatures from 200 degr ees C to 550 degrees C produced a mixed structure of amorphous and qua sicrystalline phases. Nanoindentation measurements showed that the har dness and elastic modulus of the as-sputtered Al-Cu-Fe films (9.44 GPa and 114.4 GPa, respectively) increased as the amount of the quasicrys talline phase increased on annealing. The Al-Cu-Fe film annealed at 55 0 degrees C for one hour had a hardness of 13.49 GPa and a Young's mod ulus of 141.4 GPa. A systematic increase in wear resistance with incre asing annealing temperature was observed, based on the scratch track w idth measurements. Both the as-sputtered (amorphous) and annealed (amo rphous+quasicrystalline) Al-Cu-Fe films friction (0.09-0.11) that were of the same order as for TiN films produced by reactive ion plating ( RIP). (C) 1997 Elsevier Science S.A.