Kh. Wu et al., ELECTRON-CYCLOTRON-RESONANCE ASSISTED CHEMICAL-VAPOR-DEPOSITION OF CARBON NITRIDE FILMS ON DIAMOND, Journal of applied physics, 83(3), 1998, pp. 1702-1704
Carbon nitride films were prepared using an electron cyclotron resonan
ce enhanced chemical vapor deposition apparatus. A two-step mode was a
dopted in which a diamond layer was first deposited onto the substrate
(Si or Mo), and then the carbon nitride films were grown. Detailed x-
ray photoelectron analyses show that the carbon and nitrogen atoms hav
e formed a nonpolar covalent bond. The nitrogen concentrations in the
films remain unchanged when the substrate temperatures vary from 100 t
o 700 degrees C, which suggests that a stable phase has formed. (C) 19
98 American Institute of Physics. [S0021-8979(98)04003-1].