A wide bandpass x-ray polarizer for photon energies near 8358 eV (L-II
I absorption edge of erbium) has been grown using molecular beam epita
xy. The results illustrate a general approach to preparing graded-latt
ice diffracting optical components. The active optical element is an 8
-mu m-thick single crystal film of In0.51Ga0.49Sb grown on a GaAs (001
) substrate. The alloy was chosen to ensure maximum linear polarizatio
n for the (006) Bragg reflection at the target energy. The polarizer r
eflectivity has a full width at half-maximum of 27 eV in a fixed geome
try with an angle of 90 degrees between the incident and diffracted be
ams. (C) 1997 American Institute of Physics.