Ham. Vanaert et al., SELECTIVE PHOTO-CROSS-LINKING OF MICROPHASE-SEPARATED MULTIBLOCK COPOLYMERS OF POLY(DIMETHYLSILOXANE) AND PHENYLENE DIACRYLATE POLYESTERS, Acta polymerica, 49(1), 1998, pp. 18-26
New multiblock copolymers based on dimethylsiloxanes and phenylene dia
crylate derivatives have been prepared by hydrosilation polymerization
. Copolymerization was performed using either low molecular weight mon
omers or high molecular weight macromers. The organic macromer was pre
pared by acyclic diene metathesis (ADMET) polymerization of para-pheny
lenediacrylic acid dipent-4-enyl ester. Hexamethyltrisiloxane and alph
a,omega-bishydride-terminated polydimethylsiloxane (PDMS) were used as
inorganic macromers. The copolymers show microphase separation of the
soft siloxane block and the hard semicrystalline organic block, as ob
served by differential scanning calorimetry (DSC), X-ray scattering ex
periments (SAXS and WAXS) and transmission electron microscopy (TEM).
The crosslinking rate upon UV-irradiation is slightly higher for the m
icrophase-separated copolymer than for the corresponding homopolymer.
When films of the polyester-PDMS multiblock copolymers were irradiated
with linearly polarized light, optically anisotropic films were obtai
ned with a polarizing efficiency of 67%, whereas the crosslinked films
of the homopolymer had a polarizing efficiency of at most 43%.