C. Hollenstein et al., SILICON-OXIDE PARTICLE FORMATION IN RF PLASMAS INVESTIGATED BY INFRARED-ABSORPTION SPECTROSCOPY AND MASS-SPECTROMETRY, Journal of physics. D, Applied physics, 31(1), 1998, pp. 74-84
In situ Fourier transform infrared absorption spectroscopy has been us
ed to study the composition of particles formed and suspended in radio
-frequency discharges of silane-oxygen-argon gas mixtures. The silane
gas constumption was observed by infrared absorption. The stoichiometr
y of the produced particles depends on the silane flow rate and was co
mpared with commercial colloidal silica. A small proportion of silane
gas produces nanometric stoichiometric particles whereas a large propo
rtion produces larger under-stoichiometric particles. Absorption spect
roscopy was sufficiently sensitive to reveal particles too small to be
visually observed by laser light scattering. Post-oxidation oi hydrog
enated silicon particles trapped in an argon plasma was obtained by ad
ding oxygen. Mass spectrometry oi negative and positive ions showed an
extensive range oi ionic clusters which may be at the origin of the o
bserved particle formation. A model based on an iterative reaction seq
uence gives a good agreement with the measured positive ion mass spect
rum.