LASER MELTING OF NITRIDES OF ALUMINUM, SILICON, AND BORON

Authors
Citation
Iy. Boretspervak, LASER MELTING OF NITRIDES OF ALUMINUM, SILICON, AND BORON, Quantum electronics, 27(3), 1997, pp. 259-262
Citations number
15
Journal title
ISSN journal
10637818
Volume
27
Issue
3
Year of publication
1997
Pages
259 - 262
Database
ISI
SICI code
1063-7818(1997)27:3<259:LMONOA>2.0.ZU;2-8
Abstract
An analysis is made of the heating and melting of the surfaces of cera mic samples of aluminium nitride, silicon nitride, and boron nitride b y low-intensity laser radiation. It is shown that the thickness of a m olten surface layer is governed by the thermophysical properties of th e material and by the relationship between its melting point and the i ntense-evaporation temperature. The derived dependence of the thicknes s of the molten layer on the radiation intensity is compared with the results of experiments on melting I of aluminium nitride. The publishe d experimental results on the laser heating of silicon nitride and bor on nitride are interpreted.