K. Hoshino et al., ENHANCEMENT IN CHEMICAL INTERACTION AT CONDUCTING POLYMERS N-SI INTERFACES BY THEIR ELECTROREDUCTION/, Journal of the Electrochemical Society, 145(2), 1998, pp. 711-720
Citations number
53
Categorie Soggetti
Electrochemistry,"Materials Science, Coatings & Films
Studies of chemical and electronic interaction at organic/inorganic in
terfaces are described; Electrochemical deposition of conducting polym
ers [poly(3-methylthiophene), polythiophene, poly(3-methylpyrrole), po
lypyrrole, poly(3-methylthiophene-co-pyrrole)] on an n-Si wafer does n
ot give rise to high-quality p-n heterojunctions, but it is found that
their junction properties are greatly improved by their electrochemic
al reduction (cathodic treatment). For example, the cathodic treatment
of an as-grown poly(3-methylthiophene)/n-Si junction cell with rectif
ying ratio, gamma, of 1.4 x 10(1) and diode factor, n, of 2.6 gives a
high quality junction with gamma = 1.7 x 10(4) and n = 1.2. The treatm
ent involves not only the development of polymer films but the improve
ment in junction interface, since the treatment can contribute to the
improvement only when conducted in the presence of polymer films. In o
rder to understand this modification at the interface, the effects of
cathodic treatment conditions (treatment potential and time) and the p
resence of an interfacial oxide. layer on the junction properties are
investigated. As a result, it is revealed that the improvement is expl
ained by a junction formation model described as the evolution of cova
lent bond formation at the interface; Further electrochemical studies
reveal that such bondings are disrupted by hydrolysis and/or oxidation
, and the bond disruption model is used to describe the degradation of
the junctions in the air.