AMPLITUDE MASK PATTERNED ON AN EXCIMER-LASER MIRROR FOR HIGH-INTENSITY WRITING OF LONG-PERIOD FIBER GRATINGS

Authors
PATRICK HJ ASKINS CG MCELHANON RW FRIEBELE EJ
Citation
Hj. Patrick et al., AMPLITUDE MASK PATTERNED ON AN EXCIMER-LASER MIRROR FOR HIGH-INTENSITY WRITING OF LONG-PERIOD FIBER GRATINGS, Electronics Letters, 33(13), 1997, pp. 1167-1168
Citations number
8
Categorie Soggetti
Engineering, Eletrical & Electronic
Journal title
Electronics Letters → ACNP
ISSN journal
00135194
Volume
33
Issue
13
Year of publication
1997
Pages
1167 - 1168
Database
ISI
SICI code
0013-5194(1997)33:13<1167:AMPOAE>2.0.ZU;2-5
Abstract
Masks have been produced for long period fibre grating fabrication fro m commercial dielectric laser mirrors. The masks, which were produced by direct patterning of a photoresist using an argon laser, can withst and in excess of 200mJ/cm(2) per 15ns pulse of 248nm laser light. The use of these masks decreased exposure times by 90% and nearly doubled the attenuation (dB) of a long period grating produced by a given UV f luence compared to chrome-on-silica masks.