CHARACTERIZATION AND ELECTRON FIELD-EMISSION FROM DIAMOND COATINGS DEPOSITED BY MULTIPLE LASER PROCESS

A new diamond deposition process utilizing a plasma and a variety of i nteractions from a multiple laser system]las been demonstrated, with W C:Co substrates. The process is conducted in open air and dots not inv olve hydrogen. Structural characterization of the diamond coatings. wh ich have exceptional adhesion to cutting tool inserts. indicates a cub ic diamond structure. Tungsten and cobalt atoms are incorporated into the film and a layer depleted in cobalt exists al the diamond-WC/Co in terface. Electron field emission current densities. useful for flat pa nel displays of 6 mA/cm(2) at an applied voltage of 3000 V fora film-a node distance of 20 mu m has been measured. (C) 1998 Elsevier Science S.A.