CHARACTERIZATION AND ELECTRON FIELD-EMISSION FROM DIAMOND COATINGS DEPOSITED BY MULTIPLE LASER PROCESS

Citation
A. Badzian et al., CHARACTERIZATION AND ELECTRON FIELD-EMISSION FROM DIAMOND COATINGS DEPOSITED BY MULTIPLE LASER PROCESS, DIAMOND AND RELATED MATERIALS, 7(1), 1998, pp. 64-69
Citations number
12
Categorie Soggetti
Material Science
ISSN journal
09259635
Volume
7
Issue
1
Year of publication
1998
Pages
64 - 69
Database
ISI
SICI code
0925-9635(1998)7:1<64:CAEFFD>2.0.ZU;2-4
Abstract
A new diamond deposition process utilizing a plasma and a variety of i nteractions from a multiple laser system]las been demonstrated, with W C:Co substrates. The process is conducted in open air and dots not inv olve hydrogen. Structural characterization of the diamond coatings. wh ich have exceptional adhesion to cutting tool inserts. indicates a cub ic diamond structure. Tungsten and cobalt atoms are incorporated into the film and a layer depleted in cobalt exists al the diamond-WC/Co in terface. Electron field emission current densities. useful for flat pa nel displays of 6 mA/cm(2) at an applied voltage of 3000 V fora film-a node distance of 20 mu m has been measured. (C) 1998 Elsevier Science S.A.