Ng. Ferreira et al., EVIDENCE OF ENHANCED ATOMIC-HYDROGEN PRODUCTION WITH HALOGENS IN DIAMOND MWPACVD, DIAMOND AND RELATED MATERIALS, 7(1), 1998, pp. 81-87
Optical emission spectroscopy measurements and exhaust gas mass spectr
ometry were used for diagnostics in a microwave plasma assisted chemic
al vapor deposition reactor for diamond growth. An actinometry techniq
ue was used to study the atomic hydrogen generation with additions of
CF4 and CCl2F2 in the feed gas. The relative emission intensity of the
atomic hydrogen line H-alpha (656.3 nm) was measured with CF4 and CCl
2F2 concentrations in the range of 0-5%. The results show an increase
in atomic hydrogen concentration up to 80 and 200% when CF4 and CCl2F2
are added in the mixture, respectively. The ideal actinometry conditi
ons and the validity of the observed increase of atomic hydrogen with
an change in electron temperature and density in the plasma was invest
igated. The dissociation process of CF4 and CCl2F2 associated with HF
and HCl formation were discussed by measurements of stable species by
mass spectrometry of the exhaust gas. The increase of the atomic hydro
gen concentration is correlated with the easy HCl and/or HF dissociati
on by electron-impact. (C) 1998 Elsevier Science S.A.