Wide angle x-ray diffraction on vapor deposited thin films of p-hexaph
enyl on GaAs substrates reveals that the preferred growth of the cryst
allites on the substrate is strongly dependent on the sample preparati
on conditions. At low substrate temperatures and high deposition rates
we detect two directions of preferred growth with the (11-1) and/or (
20-3) planes of hexaphenyl parallel to the surface of the substrates;
at both these orientations the molecular chains are parallel to the su
rface. At high substrate temperatures and low deposition rates the (00
1) plane is parallel to the substrate; for this type the molecular cha
ins are standing on the substrate. Some minor influence to the preferr
ed growth is given also by the purity of the hexaphenyl; the thickness
of the thin films has no effect.