ELECTRICAL-PROPERTIES OF COSI2 PRECIPITATES IN COBALT-IMPLANTED SILICON - A CONDUCTING ATOMIC-FORCE MICROSCOPY STUDY

Authors
MAO JM XU JB PENG QC WONG SP WILSON IH
Citation
Jm. Mao et al., ELECTRICAL-PROPERTIES OF COSI2 PRECIPITATES IN COBALT-IMPLANTED SILICON - A CONDUCTING ATOMIC-FORCE MICROSCOPY STUDY, Journal of materials science letters, 17(3), 1998, pp. 219-222
Citations number
8
Categorie Soggetti
Material Science
Journal title
Journal of materials science letters → ACNP
ISSN journal
02618028
Volume
17
Issue
3
Year of publication
1998
Pages
219 - 222
Database
ISI
SICI code
0261-8028(1998)17:3<219:EOCPIC>2.0.ZU;2-U