CONFORMALITY AND COMPOSITION OF FILMS DEPOSITED AT LOW-PRESSURES

Conformality limitations and film composition variations inside featur es for films deposited at low pressures are explained using examples o f studies which combine transport and reaction simulations of depositi on processes and carefully designed experimental work. In the first ex ample, the use of film profile information to decide between two kinet ic models for the deposition of SiO2 from TEOS is described. In the se cond example, composition profiles in sputter deposited Ti-W are expla ined in terms of titanium re-emission. Combined simulation and experim ental studies of film profiles and composition profiles in features is a valuable tool in efforts to arrive at useful kinetic and transport models.