ADSORPTION OF A SILVER CHEMICAL-VAPOR-DEPOSITION PRECURSOR ON POLYURETHANE AND REDUCTION OF THE ADSORBATE TO SILVER USING FORMALDEHYDE

The interaction of the silver chemical vapor deposition precursor l-4, 6-octanedionato)(trimethylphosphine)silver(I), [(fod)AgP(CH3)(3)], wit h a polyurethane surface has been investigated with reflection-absorpt ion infrared spectroscopy (RAIRS), X-ray photoelectron spectroscopy (X PS), and atomic force microscopy (AFM). The RAIR spectra show a decrea se of the intensity of both polyurethane C=O and N-H vibrational bands at 90, 300, and 340 K. This suggests that a specific interaction occu rs between [(fod)Ag(PMe3)] and polyurethane carbonyl groups at the sur face, leading to the displacement of [P(CH3)(3)]. After exposure of po lyurethane to the Ag complex at room temperature and above, XPS shows the presence only of Ag, F, and O, indicating displacement of [P(CH3)( 3)] groups. The exposure of the adsorbed (fod)Ag-polyurethane complex to formaldehyde [HCHO] leads to additional deposition of silver and to the formation and the desorption of 2,2,3,3-heptafluoro-7,7-dimethyl- 4,6-octanedione], [fodH], from the polyurethane surface. AFM indicates that the silver is present in the form of clusters. Taken together, t hese data demonstrate the feasibility of low-temperature CVD of silver on organic polymer substrates.