T. Kubo et al., ADSORBED STATES OF CO ON THE SI(100)-K SURFACE - ELECTRON-ENERGY-LOSSSPECTROSCOPY AND THERMAL-DESORPTION STUDIES, Surface science, 395(2-3), 1998, pp. 246-251
Adsorbed states of CO on the Si(100)-K surface have been studied using
high-resolution electron energy-loss spectroscopy and thermal desorpt
ion spectroscopy. Three adsorbed states of CO (alpha, alpha(0), and be
ta) were found on clean Si(100)-c(4 x 2) formed at 90 K. alpha(beta)-C
O is characterized by the C-O stretch energy of 260 (-) meV and therma
l desorption at 190 (415) K. The preadsorbed K atoms block the adsorpt
ion sites of alpha-CO and weaken the Si-C bond of the coadsorbed alpha
-CO. These results indicate that alpha-CO is predominantly bonded by t
he donation of 5 sigma electrons of CO into the pi surface state loca
lized mainly at the down atom of a Si dimer. The preadsorbed K atoms b
lock some adsorption sites of beta-CO, but have little effect on the c
hemical bond between beta-CO and Si. These results indicate that the a
dsorption sites of beta-CO are the defects on Si(100). alpha(0)-CO is
characterized by the thermal desorption at 235 K, and is also associat
ed with defects. Redshift is observed of the C-O stretch energy of alp
ha-CO with increasing K coverage, which is mainly attributed to the vi
brational Stark effect caused by the preadsorbed K adatoms. (C) 1998 E
lsevier Science B.V.