STRUCTURAL DETERMINATION FOR H2O ADSORPTION ON SI(001)2X1 USING SCANNED-ENERGY MODE PHOTOELECTRON DIFFRACTION

Authors
FRANCO N CHROST J AVILA J ASENSIO MC MULLER C DUDZIK E PATCHETT AJ MCGOVERN IT GIEBEL T LINDSAY R FRITZSCHE V BRADSHAW AM WOODRUFF DP
Citation
N. Franco et al., STRUCTURAL DETERMINATION FOR H2O ADSORPTION ON SI(001)2X1 USING SCANNED-ENERGY MODE PHOTOELECTRON DIFFRACTION, Applied surface science, 123, 1998, pp. 219-222
Citations number
16
Categorie Soggetti
Physics, Applied","Physics, Condensed Matter","Chemistry Physical","Materials Science, Coatings & Films
Journal title
Applied surface science → ACNP
ISSN journal
01694332
Volume
123
Year of publication
1998
Pages
219 - 222
Database
ISI
SICI code
0169-4332(1998)123:<219:SDFHAO>2.0.ZU;2-U
Abstract
Using scanned-energy-mode photoelectron diffraction we have determined the local adsorption geometry of the OH fragments adsorbed on Si(100) (2 X 1) surface. On this substrate water is known to adsorb dissociati vely even at low temperature (90 K), which gives rise to a surface lay er comprising coadsorbed OH and H species. The OH fragments are found to be adsorbed in off-atop sites at a dimerised surface Si atom with O -Si bond-lengths of 1.7 +/- 0.1 Angstrom and bond-angles relative to t he surface normal of 22 +/- 5 degrees. (C) 1998 Elsevier Science B.V.