Pj. Parbrook et al., SURFACE-STRUCTURE OF INP(001) UNDER DYNAMIC AND STATIC CONDITIONS OF MOLECULAR-BEAM EPITAXY, Applied surface science, 123, 1998, pp. 313-318
Citations number
13
Categorie Soggetti
Physics, Applied","Physics, Condensed Matter","Chemistry Physical","Materials Science, Coatings & Films
A combined study, using reflection high energy electron diffraction (R
HEED) and reflection anisotropy spectroscopy (RAS), has been carried o
ut on clean (001)InP surfaces prepared in a solid-source molecular bea
m epitaxy (MBE) reactor. Experiments performed under non-growing (stat
ic) conditions show the existence of a number of surface reconstructio
ns, including two distinctive (2 X 4) phases at higher substrate tempe
ratures. As the temperature is decreased (2 X 1), (2 X 2) and c(4 x 4)
reconstructions are found. The c(4 X 4) reconstruction, observed for
the first time, has a significantly different RA signature than that f
ound for GaAs, indicating that a different surface model is necessary
in this case. The RHEED patterns and RA spectra recorded for the growi
ng (dynamic) InP surface are similar to that of the static surface, wi
th the RA-signal differences between the two being accountable by the
effective change in the P-2 overpressure at the surface. Under convent
ional growth conditions, we have observed monolayer oscillations in th
e RA signal during the initial stages of InP epitaxy for the first tim
e. (C) 1998 Elsevier Science B.V.