ENHANCEMENT OF ALLOY SEGREGATION DUE TO STRAIN ASSISTED ATOMIC DIFFUSION IN HETEROEPITAXY

Citation
C. Priester et M. Lannoo, ENHANCEMENT OF ALLOY SEGREGATION DUE TO STRAIN ASSISTED ATOMIC DIFFUSION IN HETEROEPITAXY, Applied surface science, 123, 1998, pp. 658-663
Citations number
16
Categorie Soggetti
Physics, Applied","Physics, Condensed Matter","Chemistry Physical","Materials Science, Coatings & Films
Journal title
ISSN journal
01694332
Volume
123
Year of publication
1998
Pages
658 - 663
Database
ISI
SICI code
0169-4332(1998)123:<658:EOASDT>2.0.ZU;2-O
Abstract
Strain fields have proved to play a very important role in the self-or ganization of 3D islands which appear during highly mismatched epitaxy (e.g. for InAs deposited on GaAs, or SiGe/Si), In this work we focus on stress-driven atomic exchanges in inhomogeneously strained systems in order to derive - from a self consistent treatment - the stable equ ilibrium atomic distribution. For this we first calculate the energy o f an atom, as a function of the local average strain. Then we combine this relation with the strain distribution calculated for a starting a tomic configuration using a valence force field approach. Surface effe cts are also taken into account in a simple way, This study applies to alloy segregation in 3D quantum boxes before, as well as during, thei r burying process, or to alloy segregation due to surface roughening d uring the deposition of very thick lattice-matched alloy 2D layers. So me results are compared with recent experimental observations of surfa ce segregation in (Ga, In)As/GaAs quantum boxes. (C) 1998 Elsevier Sci ence B.V.