MASS DENSITY OF POLYSTYRENE THIN-FILMS MEASURED BY TWIN NEUTRON REFLECTIVITY

Citation
We. Wallace et al., MASS DENSITY OF POLYSTYRENE THIN-FILMS MEASURED BY TWIN NEUTRON REFLECTIVITY, The Journal of chemical physics, 108(9), 1998, pp. 3798-3804
Citations number
40
Categorie Soggetti
Physics, Atomic, Molecular & Chemical
ISSN journal
00219606
Volume
108
Issue
9
Year of publication
1998
Pages
3798 - 3804
Database
ISI
SICI code
0021-9606(1998)108:9<3798:MDOPTM>2.0.ZU;2-3
Abstract
Neutron reflectivity measurements on polystyrene thin films (6.5-79.0 nm thick) supported on silicon substrates indicate that the mass densi ty is near the bulk value regardless of film thickness. To account for possible inaccuracies arising from sample misalignment, reflectivity measurements were made both from the free-surface and silicon-substrat e sides of the thin film, a method termed twin reflectivity. For films spin coated on the hydrogen-terminated silicon surface the relative u ncertainty in the density measurement was on the order of 1%, but for films spin coated onto the silicon native-oxide surface the analysis w as more difficult because of subtleties in data fitting due to the oxi de layer. Nevertheless, within the limits of greater uncertainty, thes e films also showed no systematic change in density with thickness. (C ) 1998 American Institute of Physics.