S. Jonas et al., STUDIES ON THE MECHANISM OF CHEMICAL-REACTIONS DURING TIXNY LAYERS DEPOSITION, Bulletin of the Polish Academy of Sciences. Chemistry, 45(4), 1997, pp. 403-407
TiN layers are widely applied in modern technology, e.g. as coating fo
r solar cells, for the preparation of hot mirrors, in jewellery, as we
ll as in medicine for implant coating. Among the methods of TiN layer
preparation chemical vapour deposition (CVD) seems the most useful. De
position of TiN layers by CVD involves chemical processes which, apart
from adsorption and desorption, include chemical reactions in the gas
phase. The present work is a direct study of the gas phase during the
chemical vapour deposition of titanium nitrides at low temperatures (
300-1270 K). The gas phase was investigated by means of FTIR spectrosc
opy in the in situ conditions. The layers were deposited from(TiCl4 H-2 + N-2) mixtures diluted with argon in a special reaction cell.