The overlayer growth of the Sb/InAs(110) interface has been investigat
ed for room-temperature (RT) deposition and subsequent annealing, by m
eans of Auger and core-level photoemission spectroscopy. Antimony form
s an unreactive and epitaxial monolayer, followed by three-dimensional
island growth. The surface electronic transitions above the semicondu
ctor bulk gap and Sb-induced electronic states have been studied by me
ans of photoemission and high-resolution electron-energy-loss spectros
copy. The Sb/InAs(110) interface is semiconducting and the (1X1) Sb st
ructure, obtained after a thermal annealing at 600 K, presents a surfa
ce band gap of 0.42 eV at RT. Schottky barrier height, derived from th
e energy shift of the In core-level emission lines, is about 0.7 eV wi
th respect to the valence-band maximum. The evolution of the space-cha
rge layer with the formation of an accumulation layer has been deduced
from the dopant-induced free-carrier plasmon. The accumulation layer
and the Schottky barrier height are reduced when the annealing procedu
re reorders the surface to obtain the (1X1) two-dimensional structure.
[S0163-1829(98)01707-X].