PREPARATION OF PB(ZR,TI)O-3 FILM BY LASER-ASSISTED CVD

Effects of KrF excimer laser and lamp irradiations on the deposition o f Pb(Zr,Ti)O-3 film on (100)MgO substrate by metal organic chemical va por deposition (MOCVD) were investigated. The crystalline Pb(Zr,Ti)O-3 film was deposited even at 300 degrees C by the laser irradiation. Ho wever, it was deposited above 450 degrees C by lamp irradiation and wi thout irradiation. The temperature dependency of the deposition rates of Pb, Zr and Ti elements in the film was almost the same. That of lam p-irradiated and unirradiated film was monotonously increased with inc reasing deposition temperature, but was small in the case of laser-irr adiated one. The deposition rates of Pb, Zr, Ti elements in laser-irra diated film was about 8-18 times larger than that of unirradiated film . These results are considered to be due to the photo-chemical effect by the laser irradiation.