Sk. Han et al., MEASUREMENT OF MICROWAVE DIELECTRIC-CONSTANT FOR FERROELECTRIC PB(ZR,TI)O-3 THIN-FILMS, Journal of the Korean Physical Society, 32, 1998, pp. 364-366
Ferroelectric Pb(Zr-0.53, Ti-0.47)O-3[PZT] thin films with perovskite
phase were grown by sol-gel spin-on processing using solutions contain
ing metal-organic precursors of Pb, Zr, and Ti. In the range of 100 Hz
to 2 GHz, the relative dielectric constants (epsilon(r)) of the PZT f
ilms were measured as a function of frequency. For the high frequency
measurement, a microstrip transmission line with the width of 20 mu m
was patterned by using an Au(300 nm)/PZT(300 nm)/Pt(100 nm) multilayer
him grown on SiO2/Si substrates. Measuring scattering parameters, the
dielectric constant and dielectric loss of PZT films were determined
using the characteristic impedance of the microstrip transmission line
. It was observed that the PZT films have a dielectric constant of abo
ut 800 and tan delta of about 0.02 at 1 GHz and room temperature, whic
h were comparable to those obtained at the low frequency of less than
10 MHz.