Me. Merritt et al., LOCATION OF THE ANTIPLASTICIZER IN CROSS-LINKED EPOXY-RESINS BY H-2, N-15, AND C-13 REDOR NMR, Macromolecules, 31(4), 1998, pp. 1214-1220
Carbon-13 rotational-echo double-resonance (REDOR) NMR with N-15 or H-
2 dephasing, combined with N-15 REDOR NMR with C-13 dephasing, has bee
n obtained for a fully cross-linked epoxy resin prepared from a nomina
lly uniform mixture of two parts of diglycidyl ether of Bisphenol A, o
ne part of hexamethylenediamine, and 19% (by weight) antiplasticizer m
ade from a carbonyl-C-13-labeled aromatic acetamide. The antiplasitici
zer contains the hydroxypropyl ether moiety of the epoxy repeat unit.
A partially cross-linked resin was formed from five parts of epoxide,
one part of hexamethylenediamine, three parts of hexylamine, and 19% (
by weight) antiplasticizer. Labels were introduced into the resin by r
eplacing both methyl groups of the isopropylidene moiety of Bisphenol
A with CD3 groups and by using [N-15(2)]hexamethylenediamine and [N-15
]hexylamine (and their unlabeled counterparts) in various combinations
. The antiplasticizer C-13-carbonyl carbon is 4.9 +/- 0.5 Angstrom fro
m an amine N-16 (With no preference for free or cross-linked sites) an
d 6.7 +/- 1 Angstrom from a quaternary carbon of the isopropylidene mo
iety.