We report a determination of the room temperature growth and atomic st
ructure of ultrathin films of thallium on copper(001) using surface X-
ray diffraction. The results show clearly that the growth is layerwise
up to two monolayers and islanded thereafter. This is contrary to ear
lier reports which suggested that the islanding commenced at one monol
ayer. The first submonolayer structure to appear is a c(4 x 4) arrange
ment. Reflectivity scans suggest that there is significant reordering
of the substrate at this coverage.