ATOMIC-SCALE EPITAXIAL-GROWTH OF BATIO3 THIN-FILMS BY LASER MOLECULAR-BEAM EPITAXY

Citation
Hs. Wang et al., ATOMIC-SCALE EPITAXIAL-GROWTH OF BATIO3 THIN-FILMS BY LASER MOLECULAR-BEAM EPITAXY, Science in China. Series A, Mathematics, Physics, Astronomy & Technological Sciences, 40(5), 1997, pp. 522-527
Citations number
14
Categorie Soggetti
Multidisciplinary Sciences
ISSN journal
10016511
Volume
40
Issue
5
Year of publication
1997
Pages
522 - 527
Database
ISI
SICI code
1001-6511(1997)40:5<522:AEOBTB>2.0.ZU;2-Y
Abstract
By using laser molecular beam epitaxy (L-MBE), atomic scale epitaxial growth of BaTiO3(BTO) thin films on SrTiO3(STO) substrates is achieved . Measurements of reflection high energy electron diffraction (RHEED), X-ray diffraction (XRD), scanning electron microscopy, and transmissi on electron microscopy reveal that the BTO films are c-axis oriented s ingle crystals with smooth surface. The multi-layer ferroelectric/supe rconducting heterostructures are also prepared and the ferroelectric p roperties of BTO films are studied. The results show that by using L-M BE technique, high quality BTO films and improved device performance c an be obtained.