M. Buda et al., CONTROLLED ANODIC-OXIDATION FOR HIGH-PRECISION ETCH DEPTH IN ALGAAS ILL-V SEMICONDUCTOR STRUCTURES, Journal of the Electrochemical Society, 145(3), 1998, pp. 1076-1079
Citations number
12
Categorie Soggetti
Electrochemistry,"Materials Science, Coatings & Films
Controlled anodic oxidation far achieving a better control of etch dep
th in AlGaAs semiconductor structures is studied. The rates of materia
l consumption and oxide thickness growth for p(++)-GaAs and p-Al(0.38)
G(0.62)As are given for the citric acid/glycol/water electrolyte. The
etch profiles for GaAs/Al0.45Ga0.65As and GaAs/Al0.60Ga0.40As layer se
quences in laser diode structures are presented. The underetch is rath
er high and depends on oxidation conditions (constant voltage or const
ant current). The profile obtained is very rough for constant voltage
oxidation and much better when using constant current conditions. The
latter also improves the uniformity of oxide growth. The etch rate of
the anodic oxide in diluted HCl is much larger for GaAs than for AlGaA
s.