LOW-TEMPERATURE CVD OF CRYSTALLINE TITANIUM-DIOXIDE FILMS USING TETRANITRATOTITANIUM(IV)

GILMER DC COLOMBO DG TAYLOR CJ ROBERTS J HAUGSTAD G CAMPBELL SA KIM HS WILK GD GRIBELYUK M GLADFELTER WL

Dc. Gilmer et al., LOW-TEMPERATURE CVD OF CRYSTALLINE TITANIUM-DIOXIDE FILMS USING TETRANITRATOTITANIUM(IV), CHEMICAL VAPOR DEPOSITION, 4(1), 1998, pp. 9-11

37

Materials Science, Coatings & Films",Electrochemistry,"Physics, Condensed Matter

CHEMICAL VAPOR DEPOSITION → ACNP

09481907

4

1

1998

9 - 11

ISI

0948-1907(1998)4:1<9:LCOCTF>2.0.ZU;2-X